Tuning the threshold voltage of exfoliated β-Ga 2 O 3 flake-based field-effect transistors by photo-enhanced H 3 PO 4 wet etching

Jongha Son, Yongbeom Kwon, Janghyuk Kim, Jihyun Kim

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Monoclinic β-Ga 2 O 3 with an ultra-wide energy bandgap of ∼4.9 eV has facile cleavage planes because of the high anisotropy in the lattice structure. An exfoliated nanolayer flake of β-Ga 2 O 3 can be used as an active channel layer in nanoelectronics. However, the mechanical exfoliation method used poses a fundamental issue in that the separated individual layer has a random thickness, which makes it challenging to obtain reproducible device performance. In our study, we demonstrated a photo-enhanced chemical etching technique to control the thickness of exfoliated β-Ga 2 O 3 nanolayers, enabling us to adjust the threshold voltage of field-effect transistors (FETs) based on these nanolayers. Thickness-dependent device characteristics (threshold voltage, subthreshold swing, on/off ratio, and field-effect mobility) of the back-gated FETs were investigated as a function of the active channel layer (β-Ga 2 O 3 ) thickness achieved by the photo-enhanced H 3 PO 4 etching. Our study paves the way for the implementation of exfoliated β-Ga 2 O 3 nanolayers in nanoelectronics.

Original languageEnglish
Pages (from-to)Q148-Q151
JournalECS Journal of Solid State Science and Technology
Volume7
Issue number8
DOIs
Publication statusPublished - 2018

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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