TY - JOUR
T1 - Understanding of the aging pattern in quantum dot light-emitting diodes using low-frequency noise
AU - Lee, Kookjin
AU - Yun, Jinyoung
AU - Lee, Suhyeon
AU - Song, Jaeick
AU - Kim, Yeonsu
AU - Kwak, Jeonghun
AU - Kim, Gyu Tae
N1 - Funding Information:
This work was supported by the Nano-Material Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science and ICT (NRF-2017M3A7B4049119), Samsung Display Co. Ltd, and the Industrial Core Technology Development Program (10077471) funded by the Ministry of Trade, Industry & Energy of Korea.
Publisher Copyright:
© The Royal Society of Chemistry.
PY - 2020/8/7
Y1 - 2020/8/7
N2 - The negative and positive aging effects of quantum dot (QD) light-emitting diodes (QLEDs) have received considerable attention in recent years and various analysis methods have been discussed. Here, we introduce a new approach to understand the aging effect of QLEDs, which is to diagnose the behavior of carriers and traps at interfaces between each layer of the QLEDs and inside the layers themselves. In particular, low-frequency noise (LFN) measurement and the analysis of current in the QLEDs were introduced to investigate the trapping/de-trapping behaviors of carriers in the defect states in the devices. A flicker noise was observed before the carriers are injected into the QD emitting layer, while the exciton generation-recombination (G-R) noise and shot noise were observed when the electrons were injected. A correlated noise, which is the correlated model of the trapping/de-trapping of the carriers near and/or inside the QDs and the exciton recombination, was also observed above the turn-on voltage. In addition, when the devices were aged with a constant current source, rapid increases in the luminance and external quantum efficiency (EQE) were observed for up to 50 h. After 100 h of the current aging, however, the devices were negatively aged with the reduced EQE. The LFN analysis results imply that the aging phenomena mainly depend on the trapping/de-trapping of carriers. In addition to the LFN analysis, we also investigated the current density-voltage-luminance and capacitance-voltage characteristics of the devices to clarify the aging behaviors in QLEDs. This journal is
AB - The negative and positive aging effects of quantum dot (QD) light-emitting diodes (QLEDs) have received considerable attention in recent years and various analysis methods have been discussed. Here, we introduce a new approach to understand the aging effect of QLEDs, which is to diagnose the behavior of carriers and traps at interfaces between each layer of the QLEDs and inside the layers themselves. In particular, low-frequency noise (LFN) measurement and the analysis of current in the QLEDs were introduced to investigate the trapping/de-trapping behaviors of carriers in the defect states in the devices. A flicker noise was observed before the carriers are injected into the QD emitting layer, while the exciton generation-recombination (G-R) noise and shot noise were observed when the electrons were injected. A correlated noise, which is the correlated model of the trapping/de-trapping of the carriers near and/or inside the QDs and the exciton recombination, was also observed above the turn-on voltage. In addition, when the devices were aged with a constant current source, rapid increases in the luminance and external quantum efficiency (EQE) were observed for up to 50 h. After 100 h of the current aging, however, the devices were negatively aged with the reduced EQE. The LFN analysis results imply that the aging phenomena mainly depend on the trapping/de-trapping of carriers. In addition to the LFN analysis, we also investigated the current density-voltage-luminance and capacitance-voltage characteristics of the devices to clarify the aging behaviors in QLEDs. This journal is
UR - http://www.scopus.com/inward/record.url?scp=85089127666&partnerID=8YFLogxK
U2 - 10.1039/d0nr01885f
DO - 10.1039/d0nr01885f
M3 - Article
C2 - 32697229
AN - SCOPUS:85089127666
SN - 2040-3364
VL - 12
SP - 15888
EP - 15895
JO - Nanoscale
JF - Nanoscale
IS - 29
ER -