Abstract
Supported metal catalysts, particularly noble metals supported on SiO 2, have attracted considerable attention due to the importance of the silica-metal interface in heterogeneous catalysis and in electronic device fabrication. Several important issues, e.g., the stability of the metal-oxide interface at working temperatures and pressures, are not well-understood. In this review, the present status of our understanding of the metal-silica interface is reviewed. Recent results of model studies in our laboratories on Pd/SiO2/Mo(112) using LEED, AES and STM are reported. In this work, epitaxial, ultrathin, well-ordered SiO2 films were grown on a Mo(112) substrate to circumvent complications that frequently arise from the silica-silicon interface present in silica thin films grown on silicon.
Original language | English |
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Pages (from-to) | 113-124 |
Number of pages | 12 |
Journal | Catalysis Today |
Volume | 85 |
Issue number | 2-4 |
DOIs | |
Publication status | Published - 2003 Oct 15 |
Externally published | Yes |
Keywords
- Alloying and sintering
- Films
- Inter-diffusion
- Metal clusters
- Metal-support interaction
- Oxide
- Palladium
- SMSI
- STM
- Silica
- Silicide
- Supported catalysts
ASJC Scopus subject areas
- Catalysis
- Chemistry(all)