Unidirectional Anisotropy in Exchange Coupled NiFe/FeMn System for Thin NiFe Films

Y. K. Kim; L. L. Rea; K. Ha

doi:10.1109/20.489784

Unidirectional Anisotropy in Exchange Coupled NiFe/FeMn System for Thin NiFe Films

Y. K. Kim, L. L. Rea, K. Ha

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

The unidirectional exchange anisotropy field Hex was investigated in NiFe/FeMn films. It was found that the Hex is proportional to tNiFe−1.2 for 30 Å; ≤ tNiFe ≤ 400 Å where tNiFe is the NiFe film thickness. For tNiFe = 30 Å, Hex was measured to be 800 Oe in some samples. NiFe/FeMn structures on alumina underlayers were also studied; their presence reduces the strength of the anisotropy significantly.

Original language	English
Pages (from-to)	3823-3825
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	31
Issue number	6
DOIs	https://doi.org/10.1109/20.489784
Publication status	Published - 1995 Nov
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

Access to Document

10.1109/20.489784

Cite this

@article{e93a061bba664b66bdda3069e7387367,

title = "Unidirectional Anisotropy in Exchange Coupled NiFe/FeMn System for Thin NiFe Films",

abstract = "The unidirectional exchange anisotropy field Hex was investigated in NiFe/FeMn films. It was found that the Hex is proportional to tNiFe−1.2 for 30 {\AA}; ≤ tNiFe ≤ 400 {\AA} where tNiFe is the NiFe film thickness. For tNiFe = 30 {\AA}, Hex was measured to be 800 Oe in some samples. NiFe/FeMn structures on alumina underlayers were also studied; their presence reduces the strength of the anisotropy significantly.",

author = "Kim, {Y. K.} and Rea, {L. L.} and K. Ha",

year = "1995",

month = nov,

doi = "10.1109/20.489784",

language = "English",

volume = "31",

pages = "3823--3825",

journal = "IEEE Transactions on Magnetics",

issn = "0018-9464",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "6",

}

TY - JOUR

T1 - Unidirectional Anisotropy in Exchange Coupled NiFe/FeMn System for Thin NiFe Films

AU - Kim, Y. K.

AU - Rea, L. L.

AU - Ha, K.

PY - 1995/11

Y1 - 1995/11

N2 - The unidirectional exchange anisotropy field Hex was investigated in NiFe/FeMn films. It was found that the Hex is proportional to tNiFe−1.2 for 30 Å; ≤ tNiFe ≤ 400 Å where tNiFe is the NiFe film thickness. For tNiFe = 30 Å, Hex was measured to be 800 Oe in some samples. NiFe/FeMn structures on alumina underlayers were also studied; their presence reduces the strength of the anisotropy significantly.

AB - The unidirectional exchange anisotropy field Hex was investigated in NiFe/FeMn films. It was found that the Hex is proportional to tNiFe−1.2 for 30 Å; ≤ tNiFe ≤ 400 Å where tNiFe is the NiFe film thickness. For tNiFe = 30 Å, Hex was measured to be 800 Oe in some samples. NiFe/FeMn structures on alumina underlayers were also studied; their presence reduces the strength of the anisotropy significantly.

UR - http://www.scopus.com/inward/record.url?scp=0029406792&partnerID=8YFLogxK

U2 - 10.1109/20.489784

DO - 10.1109/20.489784

M3 - Article

AN - SCOPUS:0029406792

SN - 0018-9464

VL - 31

SP - 3823

EP - 3825

JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

IS - 6

ER -

Unidirectional Anisotropy in Exchange Coupled NiFe/FeMn System for Thin NiFe Films

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this