The unidirectional exchange anisotropy field Hex was investigated in NiFe/FeMn films. It was found that the Hex is proportional to tNiFe−1.2 for 30 Å; ≤ tNiFe ≤ 400 Å where tNiFe is the NiFe film thickness. For tNiFe = 30 Å, Hex was measured to be 800 Oe in some samples. NiFe/FeMn structures on alumina underlayers were also studied; their presence reduces the strength of the anisotropy significantly.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering