Uniform Si-CHA zeolite layers formed by a selective sonication-assisted deposition method

Eunjoo Kim, Wanxi Cai, Hionsuck Baik, Jungkyu Choi

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

Discrimination against the majority: The broad size distribution of conventional near-cubic Si-CHA (all-silica chabazite) zeolites impedes the formation of a close-packed layer, which is critical for the manufacture of zeolite films by secondary growth. Although present in lower abundance, platelike Si-CHA particles cosynthesized with near-cubic particles were deposited selectively on an α-Al2O3 disk to form a uniform layer.

Original languageEnglish
Pages (from-to)5280-5284
Number of pages5
JournalAngewandte Chemie - International Edition
Volume52
Issue number20
DOIs
Publication statusPublished - 2013 May 10

Fingerprint

Zeolites
Sonication
Silicon Dioxide
Silica
chabazite

Keywords

  • silica
  • sonication
  • uniform layers
  • X-ray diffraction
  • zeolites

ASJC Scopus subject areas

  • Chemistry(all)
  • Catalysis

Cite this

Uniform Si-CHA zeolite layers formed by a selective sonication-assisted deposition method. / Kim, Eunjoo; Cai, Wanxi; Baik, Hionsuck; Choi, Jungkyu.

In: Angewandte Chemie - International Edition, Vol. 52, No. 20, 10.05.2013, p. 5280-5284.

Research output: Contribution to journalArticle

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