Use of antireflection layers to avoid ghost plating on Ni/Cu plated crystalline silicon solar cells

Myeong Sang Jeong, Sung Jin Choi, Hyo Sik Chang, Jeong In Lee, Min Gu Kang, Donghwan Kim, Hee Eun Song

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Screen printing is a method commonly used for making electrodes for crystalline silicon solar cells. Although the screen-printing method is fast and easy, screen-printed electrodes have a porous structure, high contact resistance, and low aspect ratio. On the other hand, plated electrodes have low contact resistance and narrow electrode width. Therefore, the plating method could be substituted for the screen-printing method in crystalline silicon solar cells. During the plating process, ghost plating can appear at the surface when the quality of the passivation layer is poor, causing an increase in the recombination rate. In this paper, light-induced plating was applied to the fabrication of electrodes, and various passivation layers were investigated to remove ghost plating in crystalline silicon solar cells. These included, (1) SiNx deposited by plasma-enhanced chemical vapor deposition (PECVD), (2) a double SiNx layer formed by PECVD, (3) a double layer with thermal silicon oxide and SiNx deposited by PECVD, and (4) a double layer comprising SiNx and SiOx formed by PECVD. For the plated solar cells, a laser was used to remove various antireflection coating (ARC) layers and phosphoric acid was spin-coated onto the doped silicon wafer prior to laser ablation. Also, a screen-printed solar cell was fabricated to compare plated solar cells with screen-printed solar cells. As a result, we found that a thermal SiO2/PECVD SiNx layer showed the lowest pinhole density and its wet vapor transmission rate was characterized. The solar cell with the thermal SiO2/PECVD SiNx layer showed the lowest J02 value, as well as improved Voc and Jsc.

Original languageEnglish
Article number036502
JournalJapanese Journal of Applied Physics
Volume55
Issue number3
DOIs
Publication statusPublished - 2016 Mar 1

Fingerprint

Silicon solar cells
Plasma enhanced chemical vapor deposition
ghosts
plating
Plating
solar cells
Solar cells
Crystalline materials
Screen printing
vapor deposition
Electrodes
electrodes
printing
Contact resistance
Passivation
thermal plasmas
contact resistance
passivity
Antireflection coatings
Silicon oxides

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Use of antireflection layers to avoid ghost plating on Ni/Cu plated crystalline silicon solar cells. / Jeong, Myeong Sang; Choi, Sung Jin; Chang, Hyo Sik; Lee, Jeong In; Kang, Min Gu; Kim, Donghwan; Song, Hee Eun.

In: Japanese Journal of Applied Physics, Vol. 55, No. 3, 036502, 01.03.2016.

Research output: Contribution to journalArticle

Jeong, Myeong Sang ; Choi, Sung Jin ; Chang, Hyo Sik ; Lee, Jeong In ; Kang, Min Gu ; Kim, Donghwan ; Song, Hee Eun. / Use of antireflection layers to avoid ghost plating on Ni/Cu plated crystalline silicon solar cells. In: Japanese Journal of Applied Physics. 2016 ; Vol. 55, No. 3.
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