Using stop-flow lithography to produce opaque microparticles

Synthesis and modeling

Su Kyung Suh, Ki Wan Bong, T. Alan Hatton, Patrick S. Doyle

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

We report on modeling and experimental studies of the synthesis of opaque microparticles made via stop-flow lithography. Opaque magnetic beads and UV-absorbing dyes incorporated into hydrogel microparticles during synthesis changed the height and the degree of cross-linking of the polymer matrices formed. The effect of the concentration of these opaque materials on the particle height was determined experimentally and agreed well with model predictions based on the photopolymerization process over a wide range of UV absorbance. We also created particles with two independent anisotropies, magnetic and geometric, by applying magnetic fields during particle synthesis. Our work provides a platform for rational design of lithographic patterned opaque particles and also a new class of structured magnetic microparticles.

Original languageEnglish
Pages (from-to)13813-13819
Number of pages7
JournalLangmuir
Volume27
Issue number22
DOIs
Publication statusPublished - 2011 Nov 15
Externally publishedYes

Fingerprint

Hydrogel
Anisotropy
microparticles
Magnetic Fields
Lithography
Polymers
Coloring Agents
lithography
synthesis
Photopolymerization
Magnetic anisotropy
Polymer matrix
Hydrogels
Dyes
beads
Magnetic fields
platforms
dyes
anisotropy
polymers

ASJC Scopus subject areas

  • Electrochemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Materials Science(all)
  • Spectroscopy

Cite this

Using stop-flow lithography to produce opaque microparticles : Synthesis and modeling. / Suh, Su Kyung; Bong, Ki Wan; Hatton, T. Alan; Doyle, Patrick S.

In: Langmuir, Vol. 27, No. 22, 15.11.2011, p. 13813-13819.

Research output: Contribution to journalArticle

Suh, Su Kyung ; Bong, Ki Wan ; Hatton, T. Alan ; Doyle, Patrick S. / Using stop-flow lithography to produce opaque microparticles : Synthesis and modeling. In: Langmuir. 2011 ; Vol. 27, No. 22. pp. 13813-13819.
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