Variation of poly-Si grain structures under thermal annealing and its effect on the performance of TiN/Al 2 O 3 /Si 3 N 4 /SiO 2 /poly-Si capacitors

Suk Bum Hong, Ju Hyun Park, Tae Ho Lee, Jun Hee Lim, Changhwan Shin, Young Woo Park, Tae Geun Kim

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