This paper presents a new simple metal patterning technique, which is based on soft nanoimprint lithography. By using this method with a commercial Ag nano particle ink, a nano-sized metal pattern was successfully fabricated. The problem of the residual layer of patterned Ag layer was minimized by controlling the concentration of the solution and the process conditions. By using this method, we could easily fabricate various patterns without reference to any shape. Furthermore, we fabricated an Ag mesh type pattern for the application of conducting transparent glass.
- Ag nano particle solution
- No residual layer
- nano-sized metal pattern
- soft-nano imprint lithography
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials