Vertically oriented, three-dimensionally tapered deep-subwavelength metallic nanohole arrays developed by photofluidization lithography

Sol Ah Lee, Hong Suk Kang, Jung Ki Park, Seungwoo Lee

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

Various metallic nanostructural motifs have attracted significant interest due to their exotic ability to localize and manipulate light in the nanoscale regime far beyond the diffraction limit. The incident visible light can be resonantly squeezed and focused into a deep-subwavelength-scaled point with high coupling efficiency by taking advantage of the 3D tapered geometry; consequently, the EOT, enabled by nanofocusing, was achieved even with deep-subwavelength-scaled metallic nanohole. The top and bottom radii of the truncated nanocone were 300 nm and 250 nm, respectively, while its height was 250 nm. First, the vertically oriented metallic nanohole enables efficient optical excitation of relevant plasmonic mode simply by light irradiation in a normal direction. Second, the 3D tapered geometry, rather than a simple cylindrical shape, offers an attractive way to enhance the efficiency of light coupling and nanofocusing into the deep-subwavelength-scaled spatial point.

Original languageEnglish
Pages (from-to)7521-7528
Number of pages8
JournalAdvanced Materials
Volume26
Issue number44
DOIs
Publication statusPublished - 2014 Jan 1
Externally publishedYes

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Lithography
Geometry
Photoexcitation
Diffraction
Irradiation

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Vertically oriented, three-dimensionally tapered deep-subwavelength metallic nanohole arrays developed by photofluidization lithography. / Lee, Sol Ah; Kang, Hong Suk; Park, Jung Ki; Lee, Seungwoo.

In: Advanced Materials, Vol. 26, No. 44, 01.01.2014, p. 7521-7528.

Research output: Contribution to journalArticle

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