Vertically oriented, three-dimensionally tapered deep-subwavelength metallic nanohole arrays developed by photofluidization lithography

Sol Ah Lee; Hong Suk Kang; Jung Ki Park; Seungwoo Lee

doi:10.1002/adma.201403098

Vertically oriented, three-dimensionally tapered deep-subwavelength metallic nanohole arrays developed by photofluidization lithography

Sol Ah Lee, Hong Suk Kang, Jung Ki Park, Seungwoo Lee

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	7521-7528
Number of pages	8
Journal	Advanced Materials
Volume	26
Issue number	44
DOIs	https://doi.org/10.1002/adma.201403098
Publication status	Published - 2014 Nov
Externally published	Yes

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.201403098

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title = "Vertically oriented, three-dimensionally tapered deep-subwavelength metallic nanohole arrays developed by photofluidization lithography",

author = "Lee, {Sol Ah} and Kang, {Hong Suk} and Park, {Jung Ki} and Seungwoo Lee",

year = "2014",

month = nov,

doi = "10.1002/adma.201403098",

language = "English",

volume = "26",

pages = "7521--7528",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-VCH Verlag",

number = "44",

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T1 - Vertically oriented, three-dimensionally tapered deep-subwavelength metallic nanohole arrays developed by photofluidization lithography

AU - Lee, Sol Ah

AU - Kang, Hong Suk

AU - Park, Jung Ki

AU - Lee, Seungwoo

PY - 2014/11

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DO - 10.1002/adma.201403098

M3 - Article

AN - SCOPUS:84918799046

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SP - 7521

EP - 7528

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 44

ER -

Vertically oriented, three-dimensionally tapered deep-subwavelength metallic nanohole arrays developed by photofluidization lithography

ASJC Scopus subject areas

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